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1 Stress control of reactively sputtered thick NbN film on Si wafer changing the location of the substrate Si wafer against the Nb target on a magnetron cathode [会议论文]

作者:Suzuki, Y.^1;Iguchi, N.^1;Adachi, K.^1;等

关键词:Bending analysis;Deposition conditions;...

会议举办机构:Institutes of Innovation for Future Society, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusaku, Nagoya

会议时间:2017

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